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- Learning outcomes
- 1 Structural devices: a static role
- 2 Form and function, method and material
- 3 Building atomic force microscope probes
- 3.1 Introduction
- 3.2 The principles of scanning probe microscopes
- 3.3 The scanning tunnelling microscope
- 3.4 The atomic force microscope
- 3.5 Scanning modes of the AFM
- 3.6 Design considerations for AFM probes
- 3.7 Micromachining the AFM tip and cantilever
- 3.8 Review
- 4 Piezoelectricity: motion from crystals
- 5 Short range forces
- 6 Vibrations and resonance
- 7 Deposition
- 7.1 Introduction
- 7.2 Film properties
- 7.3 Depositing metals and alloys
- 7.4 Depositing compounds
- 8 Etching
- 8.1 Introduction
- 8.2 Wet etches: acids and bases
- 8.3 Gas-phase etching
- 8.3.1 Fluorine-based etching of silicon
- 8.3.2 Sputter etching: argon ion etching of gold
- 8.3.3 Reactive ion etching: chlorine/argon plasma etching of aluminium
- 8.3.4 Etchants and protectants: sulphur hexafluoride/oxygen plasma etching of siliconL
- 8.3.5 Alternative plasma chamber designs: MERIE and ICP
- 8.3.6 Deep silicon etching
- 8.4 Stopping the etch
- 8.5 Review
- Current section: Conclusion
- Keep on learning
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20 hours study
Level 3: Advanced
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