Science, Maths & Technology
Chemical vapour deposition (CVD)
...Physical vapour deposition), needing no special attachments, clamping or rotation. A batch process. Throughput depends on component size and coating thickness (greater than PVD). Coating rates vary greatly from 1 μm h-1 for Ti (C, N) coatings to 500 μm h-1 for tungsten, typically 5–20 μm h-1. Coating of machine and press tools at a higher temperature (>900°C) than...